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Resumo(s)
Self-standing vertically oriented carbon nanostructures (VCNs) were synthesized using a large-scale microwave plasma under low-pressure conditions, employing methane as a carbon precursor. The influence of plasma operational and substrate conditions on nanostructure growth and morphology were systematically studied. Furthermore, post-synthesis N-doping of VCNs with nitrogen content of 2.4 at% N was achieved using an Ar-N2 microwave plasma. Plasma-enabled direct deposition of VCNs, both doped and un-doped, onto nickel foils has been accomplished. The assessment of the developed nanostructures as electrodes in high-frequency AC filtering capacitors, has demonstrated an overall capacitance of approximately 480 µF at 100 Hz, with a cut-off frequency of 4 kHz for a phase angle of −45°. The excellent electrochemical performance can be attributed to the appropriate structural and morphological properties peculiar for the directly deposited on nickel foil VCNs providing binder-free electrode fabrication, thus enhancing the electrode's conductivity and charge transfer kinetics. This plasma-enabled approach for electrode design on a large scale, coupled with excellent filtering performance, paves the way for many applications in high-frequency scenarios, offering an environmentally friendly alternative to conventional electrolytic capacitors.
Descrição
UC, NMS and JZ acknowledge the Slovenian Research Agency ( ARIS ) for the projects Z2-4467 , J2-50074 and program No. P1-0417 and EU Graphene Flagship FLAG-ERA III JTC 2021 project VEGA ( PR-11938 ) and M-ERA.NET 3 project ANGSTROM (The project is funded by Ministrstvo za visoko solstvo, znanost in inovacije \u2013 MVZI, Slovenia).
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© 2024 The Author(s)
Palavras-chave
Binder-free electrodes High-frequency AC filtering capacitors Microwave plasma growth Plasma post-synthesis N-doping Vertically oriented carbon nanostructures Condensed Matter Physics Surfaces and Interfaces Surfaces, Coatings and Films
