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Plasma-enabled growth of vertically oriented carbon nanostructures for AC line filtering capacitors

2024-12-15Artigo científico Acesso aberto
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dc.contributor.authorBundaleska, N.
dc.contributor.authorFelizardo, E.
dc.contributor.authorSanthosh, N. M.
dc.contributor.authorUpadhyay, K. K.
dc.contributor.authorBundaleski, N.
dc.contributor.authorTeodoro, O. M. N. D.
dc.contributor.authorBotelho do Rego, A. M.
dc.contributor.authorFerraria, A. M.
dc.contributor.authorZavašnik, J.
dc.contributor.authorCvelbar, U.
dc.contributor.authorAbrashev, M.
dc.contributor.authorKissovski, J.
dc.contributor.authorMão de Ferro, A.
dc.contributor.authorGonçalves, B.
dc.contributor.authorAlves, L. L.
dc.contributor.authorMontemor, M. F.
dc.contributor.authorTatarova, E.
dc.contributor.institutionCeFITec – Centro de Física e Investigação Tecnológica
dc.contributor.institutionDF – Departamento de Física
dc.contributor.pblNorth-Holland | Elsevier
dc.date.accessioned2025-02-05T21:17:07Z
dc.date.available2025-02-05T21:17:07Z
dc.date.issued2024-12-15
dc.descriptionUC, NMS and JZ acknowledge the Slovenian Research Agency ( ARIS ) for the projects Z2-4467 , J2-50074 and program No. P1-0417 and EU Graphene Flagship FLAG-ERA III JTC 2021 project VEGA ( PR-11938 ) and M-ERA.NET 3 project ANGSTROM (The project is funded by Ministrstvo za visoko solstvo, znanost in inovacije \u2013 MVZI, Slovenia). Publisher Copyright: © 2024 The Author(s)
dc.description.abstractSelf-standing vertically oriented carbon nanostructures (VCNs) were synthesized using a large-scale microwave plasma under low-pressure conditions, employing methane as a carbon precursor. The influence of plasma operational and substrate conditions on nanostructure growth and morphology were systematically studied. Furthermore, post-synthesis N-doping of VCNs with nitrogen content of 2.4 at% N was achieved using an Ar-N2 microwave plasma. Plasma-enabled direct deposition of VCNs, both doped and un-doped, onto nickel foils has been accomplished. The assessment of the developed nanostructures as electrodes in high-frequency AC filtering capacitors, has demonstrated an overall capacitance of approximately 480 µF at 100 Hz, with a cut-off frequency of 4 kHz for a phase angle of −45°. The excellent electrochemical performance can be attributed to the appropriate structural and morphological properties peculiar for the directly deposited on nickel foil VCNs providing binder-free electrode fabrication, thus enhancing the electrode's conductivity and charge transfer kinetics. This plasma-enabled approach for electrode design on a large scale, coupled with excellent filtering performance, paves the way for many applications in high-frequency scenarios, offering an environmentally friendly alternative to conventional electrolytic capacitors.en
dc.description.versionpublishersversion
dc.description.versionpublished
dc.format.extent12
dc.format.extent9516688
dc.identifier.doi10.1016/j.apsusc.2024.161002
dc.identifier.issn0169-4332
dc.identifier.otherPURE: 102068191
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dc.identifier.otherScopus: 85201605128
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dc.identifier.otherORCID: /0000-0002-3424-2847/work/177441926
dc.identifier.urihttp://hdl.handle.net/10362/178489
dc.identifier.urlhttps://www.scopus.com/pages/publications/85201605128
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dc.language.isoeng
dc.peerreviewedyes
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dc.relationInstitute for Plasmas and Nuclear Fusion
dc.relationExploring plasma driven assembling of graphene based hybrid nanostructures
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dc.relationCentro de Química Estrutural
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dc.relationPlasma Enabled and Graphene Allowed Synthesis of Unique nano Structures
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dc.relationinfo:eu-repo/grantAgreement/FCT/Concurso de avaliação no âmbito do Programa Plurianual de Financiamento de Unidades de I&D (2017%2F2018) - Financiamento Programático/UIDP%2F00068%2F2020/PT
dc.relationinfo:eu-repo/grantAgreement/EC/H2020/766894/EU
dc.subjectBinder-free electrodes
dc.subjectHigh-frequency AC filtering capacitors
dc.subjectMicrowave plasma growth
dc.subjectPlasma post-synthesis N-doping
dc.subjectVertically oriented carbon nanostructures
dc.subjectCondensed Matter Physics
dc.subjectSurfaces and Interfaces
dc.subjectSurfaces, Coatings and Films
dc.titlePlasma-enabled growth of vertically oriented carbon nanostructures for AC line filtering capacitorsen
dc.typejournal article
degois.publication.titleApplied Surface Science
degois.publication.volume676
dspace.entity.typePublication
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