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Polaritonic Crystal Resonances in Transparent Mesh Electrodes
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O desenvolvimento de elétrodos condutores transparentes (TCEs) avançados é crucial para dispositivos optoeletrónicos de próxima geração, tais como células solares, LEDs e sensores. Neste trabalho, explorámos o dimensionamento de elétrodos de malha metálica e fabricámos malhas de prata utilizando litografia coloidal. São introduzidas duas arquiteturas que operam em diferentes regimes óticos: a micromalha fotónica (PhoMM) e a nanomalha plasmónica (PlaNM). A PhoMM usufrui de altas condutividades e uma transmissão de janela óptica, enquanto a PlaNM tira proveito de ressonâncias plasmónicas associadas ao fenómeno da Transmissão Ótica Extraordinária. Para além disso, a arquitetura PhoMM fabricada com litografia coloidal apresentou um perfil parabólico que guia a luz para os orifícios. Assim, ambas as arquiteturas conseguiram uma transmissão de luz superior à fração de área dos buracos. Simulações numéricas demonstraram que a PlaNM pode atingir transmitâncias até 99% em comprimentos de onda ressonantes num cenário ideal, apresentar uma resistência por folha de 1,1 ohm/sq. Foi desenvolvida uma metodologia de dimensionamento que fornece um algoritmo prático e eficiente para o dimensionamento de arquiteturas arbitrárias de nano/micro-malhas com qualquer geometria periódica e para qualquer dispositivo optoeletrónico. Através deste algoritmo, ambas as arquiteturas foram dimensionadas e posteriormente fabricadas, tendo as PhoMM demonstrado uma figura de mérito (FoM) de Hackee tão elevada quanto 7,5 x 10-2 ohm-1 e as melhores PlaNM tão elevadas quanto 3,8 x 10-3 ohm-1, ambas superiores ao ITO padrão (2,0 x 10-3 ohm-1). Este trabalho realça o potencial e fornece diretrizes sem precedentes para a obtenção de uma transmissão melhorada, tanto plasmónica como fotónica, em malhas metálicas com altas condutividades.
The advancement of transparent conductive electrodes (TCEs) is crucial for next-generation optoelectronic devices, including solar cells, LEDs, and sensors. In this work, metallic mesh electrodes (MMEs) are designed and fabricated using colloidal lithography (CL), introducing two distinct architectures: the photonic micromesh (PhoMM) and the plasmonic nanomesh (PlaNM). The PhoMM is designed to maximize electrical conductivity while ensuring high optical transmission through a well-defined spectral window within the ray-optics realm. On the other hand, the PlaNM exploits plasmonic resonances, particularly the Extraordinary Optical Transmission phenomenon to enhance light propagation through subwavelength apertures. Moreover, the fabricated PhoMM samples exhibited a parabolic profile characteristic of CL, which waveguides light into the hole. As such, both architectures achieve light transmission above the area fraction of holes. Numerical simulations revealed that the PlaNMs can achieve transmittance values as high as 99% at resonant wavelengths while maintaining a sheet resistance of 1.1 ohm/sq. A design methodology was developed that provides a practical and efficient algorithm for the dimensioning of arbitrary nano/micro-mesh architectures of any given periodic geometry and for any optoelectronic device. Through this algorithm, both architectures were dimensioned and then fabricated, where PhoMMs demonstrated Hackee’s figure of merit (FoM) as high as 7.5 x 10-2 ohm-1 and the best PlaNMs as high as 3.8 x 10-3 ohm-1, both exceeding the benchmark for ITO (2.0 x 10-3 ohm-1). This work unveils the potential of MMEs as high-performance transparent conductive materials, offering superior optoelectronic performances compared to standard alternatives. By establishing versatile design guidelines, this work provides a pathway for further advancements in optoelectronics, enabling the integration of tailored photonic and plasmonic functionalities into next-generation devices.
The advancement of transparent conductive electrodes (TCEs) is crucial for next-generation optoelectronic devices, including solar cells, LEDs, and sensors. In this work, metallic mesh electrodes (MMEs) are designed and fabricated using colloidal lithography (CL), introducing two distinct architectures: the photonic micromesh (PhoMM) and the plasmonic nanomesh (PlaNM). The PhoMM is designed to maximize electrical conductivity while ensuring high optical transmission through a well-defined spectral window within the ray-optics realm. On the other hand, the PlaNM exploits plasmonic resonances, particularly the Extraordinary Optical Transmission phenomenon to enhance light propagation through subwavelength apertures. Moreover, the fabricated PhoMM samples exhibited a parabolic profile characteristic of CL, which waveguides light into the hole. As such, both architectures achieve light transmission above the area fraction of holes. Numerical simulations revealed that the PlaNMs can achieve transmittance values as high as 99% at resonant wavelengths while maintaining a sheet resistance of 1.1 ohm/sq. A design methodology was developed that provides a practical and efficient algorithm for the dimensioning of arbitrary nano/micro-mesh architectures of any given periodic geometry and for any optoelectronic device. Through this algorithm, both architectures were dimensioned and then fabricated, where PhoMMs demonstrated Hackee’s figure of merit (FoM) as high as 7.5 x 10-2 ohm-1 and the best PlaNMs as high as 3.8 x 10-3 ohm-1, both exceeding the benchmark for ITO (2.0 x 10-3 ohm-1). This work unveils the potential of MMEs as high-performance transparent conductive materials, offering superior optoelectronic performances compared to standard alternatives. By establishing versatile design guidelines, this work provides a pathway for further advancements in optoelectronics, enabling the integration of tailored photonic and plasmonic functionalities into next-generation devices.
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Palavras-chave
Transparent Conductive Electrodes Metallic Mesh Electrodes Plasmonic Crystal Resonances Extraordinary Optical Transmission Design Methodology Colloidal-Lithography