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Fully transparent ZnO thin-film transistor produced at room temperature

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Fully transparent thin-film transistors (TFTs) are produced at room temperature by radiofrequency magnetron sputtering. Measuring the drain current (IDS) as a function of drain voltage (VDS) at different gate voltages (VGS) shows the TFTs possess hard saturation with on-currents of about 0.2 mA (see Figure) and saturation mobilities of 20 cm2 V-1 s-1. The optical and electrical properties and the compatibility of the fabrication process with low-cost plastic substrates show promise for invisible and flexible electronic circuits.

Descrição

Advanced Materials, Vol. 17, nº 5

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Field-effect transistors Zinc oxide

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Editora

Wiley-VCH Verlag GmbH & Co.

Licença CC