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Lithographic mask defects mitigation on a multimode interference structure

2020-09Artigo científico Acesso aberto
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dc.contributor.authorLourenço, Paulo
dc.contributor.authorFantoni, Alessandro
dc.contributor.authorCosta, João
dc.contributor.authorVieira, M.
dc.contributor.institutionCTS - Centro de Tecnologia e Sistemas
dc.contributor.institutionUNINOVA-Instituto de Desenvolvimento de Novas Tecnologias
dc.contributor.institutionDEE - Departamento de Engenharia Electrotécnica e de Computadores
dc.contributor.institutionDEE2010-A2 Electrónica
dc.contributor.pblSociedad Espanola de Optica
dc.date.accessioned2021-07-19T22:18:07Z
dc.date.available2021-07-19T22:18:07Z
dc.date.issued2020-09
dc.descriptionLISBOA-01-0145-FEDER-031311 SFRH/BD/144833/2019 PTDC/NAN-OPT/31311/2017 IPL/2019/BioPlas-ISEL IPL/2019/MO-TFT-ISEL.
dc.description.abstractOver the last decades, the lithographic technology has greatly contributed for the confirmation of Moore's law in the semiconductor industry. Key developments in lithography such as the operational wavelength decreasing, together with a performance increase in lens and imaging technology, enabled the reduction of cost per function in integrated circuits technology. In this work, the impact of lithographic defects introduced by the manufacturing process is analyzed through simulations and two mitigation techniques are presented. These perturbations are a consequence of the limited lithographic mask resolution reflected on deviations from the geometry of the ideal device. For this purpose, the Beam Propagation and Finite Differences Time Domain methods have been used to simulate a multi-mode interference structure based on silicon nitride. The structure is affected by random perturbations and the obtained results revealed a strong dependence between mask resolution, and imbalance and power loss. Two strategies have been followed concerning the mitigation of power loss and imbalance: - Access waveguides tapering and adjustable power splitting ratios through the electro-optic effect. Both strategies revealed results that indicate an improvement on device’s performance. However, once built, the former is a static design that favors indiscriminately all propagating modes in the multimode section. In the latter, finer tuning capabilities targeting different propagating modes may be enabled by dynamic compensation of power loss and imbalance, when in a closed loop control architecture. Such a control architecture may operate by sampling the output waveguides, extracting the error signal and, finally, negatively feeding it back to the electro-optic effect system, hence improving imbalance and power loss.en
dc.description.versionpublishersversion
dc.description.versionpublished
dc.format.extent11
dc.format.extent718116
dc.identifier.doi10.7149/OPA.53.3.51042
dc.identifier.issn0030-3917
dc.identifier.otherPURE: 32651533
dc.identifier.otherPURE UUID: b53b7bcf-f1cf-49a2-92a3-17ef945ed665
dc.identifier.otherScopus: 85096342957
dc.identifier.otherWOS: 000606332400003
dc.identifier.urihttp://hdl.handle.net/10362/121307
dc.identifier.urlhttps://www.scopus.com/pages/publications/85096342957
dc.language.isoeng
dc.peerreviewedyes
dc.relationinfo:eu-repo/grantAgreement/FCT/5876/147324/PT
dc.subjectBeam propagation method
dc.subjectchemical potential
dc.subjectfinite differences time domain
dc.subjectgraphene
dc.subjectlithographic resolution
dc.subjectmultimode interference
dc.subjectElectronic, Optical and Magnetic Materials
dc.subjectAtomic and Molecular Physics, and Optics
dc.subjectEngineering (miscellaneous)
dc.subjectMechanical Engineering
dc.titleLithographic mask defects mitigation on a multimode interference structureen
dc.typejournal article
degois.publication.firstPage1
degois.publication.issue3
degois.publication.lastPage11
degois.publication.titleOptica Pura y Aplicada
degois.publication.volume53
dspace.entity.typePublication
oaire.awardNumberUID/EEA/00066/2013
oaire.awardURIinfo:eu-repo/grantAgreement/FCT/5876/UID%2FEEA%2F00066%2F2013/PT
oaire.fundingStream5876
project.funder.identifierhttp://doi.org/10.13039/501100001871
project.funder.nameFundação para a Ciência e a Tecnologia
rcaap.rightsopenAccess
relation.isProjectOfPublicationab1536c5-2fb3-40cb-9d02-72503b9872f1
relation.isProjectOfPublication.latestForDiscoveryab1536c5-2fb3-40cb-9d02-72503b9872f1

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